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True Infrared Furnaces

Production IR Furnace Index

Production and laboratory furnace solutions table

SERIESDESCRIPTIONAPPLICATIONS
D-Series
Ovens & Dryers
D-Series IR Ovenhtml
IR Dryers & ovens for drying and/or curing with infrared energy from 90-400C. Belt widths from 10" to 36" with edge heaters provide excellent uniformity across the belt and precise, repeatable zone temperature control. D-series IR dryers are used for precision thick film drying, baking and curing of polyimide coatings or embedded components. Ideal for production heat processing applications, surface heating, drying and curing speciality coatings and finishing operations.
LA-Series
Laboratory Furnaces

New LA-series Production IR Furnaces html
Compact versatile 1000°C furnaces with 30-inch long heating chamber (3 or 4-zones), 15" transition and 30" long closed atmosphere cooling section. Flexibility, process precision, temperature range, and controlled atmosphere capabilities similar to our larger models.

Process gas: CDA, N2 or FG.
Belt widths 6", 9" or 10".
LA-series furnaces are used for experimental, prototype and specialty production applications where rapid heat rise in a controlled process atmosphere in a small footprint is of particular interest.

Clean air compatible to Class 1000, the LA-series can process substrates, wafers, PCBs, metal, ceramic or glass parts for VOC burnout, thick film firing, solar cell firing, semiconductor package sealing: solder lid seal, glass seal, low oxygen solder seal (<20ppmv), epoxy die attach, polymer curing, reflow soldering, and precious metals and alloy brazing and annealing.
LA-series Dental
Production Lab Series
New LA-309 Production IR Furnaces html
Compact 1000°C furnaces with 30-inch long heating chamber (3 or 4-zones), 15" transition and 30" long closed atmosphere cooling tunnel cooled nitrogen or forming gas (FG).

Process gas may be nitrogen or FG. Belt widths 6", 9" or 10".
LA-series furnaces are ideal for dental lab or production processing applications that require rapid heat rise in a controlled process atmosphere in a small footprint. Features process precision, temperature range, and controlled atmosphere.

Specialty Brazing. The LA-Dental series furnace is particularly suited for dental brazing applications including silver alloys with copper, zinc, tin, cadmium and/or nickel. The CACT cooling tunnel cools in a controlled atmosphere to produce bright, high strength joints.
LA-series SiC
High Temp Lab Furnaces
LA-306-SiC Production IR Furnaces html
Compact versatile 1150°C furnaces with 30-inch long heating chamber (3-zones), 15" transitions and 30" long cooling section. Features process precision, temperature range, and controlled atmosphere.

Process gas may be CDA, N2 or FG. Belt widths 6", 9" or 10".
LA-series furnaces are ideal for high temperature lab or production processing applications where precise heat rise in a controlled process atmosphere in a small footprint is necessary.

Clean air compatible to Class 1000, the LA-series can process substrates, wafers, PCBs, metal, ceramic, sapphire or glass parts, thick film firing and ferrous and non-ferrous alloys, precious metals and alloy brazing and annealing.
SMD-Series
Semiconductor Packaging

SMD-Series IR Furnacehtml
SMD-series 600°C IR furnaces with 60" to 120" long heating chambers (4 to 12-zones), belts 10" to 20" wide. Tested against convention furnace technology, SMD-series furnaces offer faster setup and stabilization time; repeatable profiles; no degrade of seal process; lower internal cavity moisture content and comparable hermetic performance; lowest ppm defect rates; and superior temperature uniformity. Inert atmosphere for fine pitch solder pastes.  Diffuse near and medium IR heating efficiency without color selectivity.

Choose Air for low cost; Nitrogen (max 500 ppm oxygen) reduces board browning and flux charring for easier cleaning; or nitrogen (control to 5 ppm oxygen) for 40-60% faster processing speeds, lower defect rates, and improved secondary soldering yields, ideal for high volume critical applications.
Electronic industry semiconductor packaging, frame attach, die attach and sealing applications.

Also used for ceramic and glass epoxy applications and a variety of production processes including:
    ▪  Curing polymer thick film materials
    ▪  Epoxy potting compounds
    ▪  Nonmenclature & legend inks
    ▪  Conformal coatings
    ▪  Bonding epoxys/encapsulating epoxys on IC's
    ▪   Process heat shrink tubing
    ▪  Bake photo resist on silicon wafers
    ▪  Dry thick film pastes.
TF-Series
Thick Film Process Furnaces
TF-Series IR Furnace html html
TF-series 1000°C thick film production furnaces utilize high level near infrared radiation to rapidly and accurately fire resistors, conductors and dielectrics in a controlled clean, dry atmosphere. The furnaces are designed to cycle on a daily or more frequent basis.  They will stabilize at 800-1000°C from an ambient start in under 20 minutes.  Major profile changes can be accomplished in minutes, allowing the furnace to be regularly used for a variety of processes. 

Production rates of up to 23,000 square inches per hour (16 ipm) can be achieved, with still higher rates for some conductors and dielectrics. 
Designed for 280-1000°C volume production of noble metal thick film products, metal, ceramic and glass inks screen-printed on a variety of substrates for production of surface mount devices, hybrid integrated circuits and sensors including  semiconductor package sealing:  solder lid seal, glass seal, low oxygen solder seal (<20ppmv), glass seal, epoxy die attach and other electronic devices.

The energy-rich, radiant environment allows all thick film materials to be processed very rapidly.  Resistors are processed at total profile times of 12-15 minutes while conductors and dielectrics can be fired in as little as 10 minutes.  This environment affords tighter distribution of process parts and also gives the processor the ability to cofire multilayers up to 300µm thick.
S-Series
High temperature Furnaces

S-Series IR Furnace
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 S-series 1000°C furnaces offer high production yield and throughput and feature start-up often in less than 30 minutes, precise and repeatable zone temperature control, temperature profiles to 1000°C, and controlled-atmosphere capability of 1-5 ppm above incoming gas purity.  The S-Series Infrared Furnaces utilize high intensity heat to achieve exacting temperature profiles, with rapid heat rise and no overshoot. Two to 12-Zone systems available. Belts: 9" to 20" wide. Water cooled, fan cooled and combination cooling sections configured to suit. Ideal for many high-temperature semiconductor and thick-film processing.  The rapid heat rise of these furnaces is of particular advantage in the final lid sealing or die attach process since the semi-conductor is not exposed to prolonged high temperature. In lead frame attachment, there is no contact with the part to cause distortion in the frame. All leads remain planar which greatly facilitates subsequent automatic wire bonding steps.
S-Series Hydrogen
Hydrogen Production Furnaces

S-Series IR Furnace

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 S-series 1000°C hydrogen furnaces offer on-board mixing of hydrogen and nitrogen for the optimum environment. Process gas sample system with oxygen analyzer, combustion monitors, iginitors and software controlled permissions offer safe high production yield. Precise and repeatable zone temperature control to 1000°C and controlled-atmosphere capability of 1-5 ppm above incoming gas purity.  The S-Series Infrared Furnaces utilize high intensity heat to achieve exacting temperature profiles, with rapid heat rise and no overshoot.  Two to 12-Zone systems available.Ideal for many high-temperature semiconductor and thick-film processing.  The rapid heat rise of these furnaces is of particular advantage in the final lid sealing or die attach process since the semi-conductor is not exposed to prolonged high temperature. In lead frame attachment, there is no contact with the part to cause distortion in the frame. All leads remain planar which greatly facilitates subsequent automatic wire bonding steps.
AG-Series
Multistage Production Furnaces
 AG-Series IR Furnace
Infrared furnace temperatures up to 1000°C, multistage temperature profiles, rapid removal of volatiles with multiple intermediate exhausts, inline drying and firing, multiple atmospheres with gas barriers, clean room compatible. Two to 12-Zone systems available.Silver-glass die attach, CERDIP and similar processes requiring multi-stage temperature profiles and rapid removal of volatiles. These capabilities are facilitated by the use of multiple intermediate exhaust stacks. Ideal for single and two stage silver-glass die attach profiles, as well as solar-cell and green tape drying and firing sequences.
SC-Series
Solar Cell Prodcution FurnacesS-Series IR Furnace html

SC-Series

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SCD-Series

Fast eficient high speed production infrared furnace.  SC-series furnaces offer high production yield and throughput, feature start-up often in less than 30 minutes, precise and repeatable zone temperature control, temperature profiles up to 1000°C, and controlled-atmosphere capability of 1-5 ppm above incoming gas purity.  The SC-Series Solar Cell furnace can be combined with an integral dryer in the SCD-Series Solar Cell system. High-temperature high volume photovoltaic applications.  The rapid heat rise of these furnaces is of particular advantage in the final  process.

All standard models include an industrial rack mounted computer with LCD  screen, full size keyboard interface and Ethernet high-speed network connections to facilitate view and control of the furnace by managers and process engineers from any location. Four (4) local USB ports are provided, convenient for connecting a furnace profiler and jump drive storage devices.


Controlled Atmosphere Continuous Belt Furnaces

Infrared Furnaces, Dryers & Ovens

Advanced Materials Polymer Curing Oven & Dental IR Belt Furnace Equipment

Lab IR Furnaces & Laboratory Ovens

High Temperature IR Furnace

Industrial Grade Production IR Furnaces

Proven Cost Effective Modular Design - Built to order - Made in USA.

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